Image data correction method, lithography simulation method,...

Details Image data correction method, lithography simulation method,... Image data correction method, lithography simulation method,...

2007-12-25

2007-12-25

Garbowski, Leigh M. (Department: 2825)

Computer-aided design and analysis of circuits and semiconductor

Nanotechnology related integrated circuit design

C716S030000, C716S030000

Reexamination Certificate

active

11138408

ABSTRACT:
An image data correction method includes preparing correction data for correcting a distortion of an image obtained by an image acquiring section, acquiring outline data of a desired pattern obtained by the image acquiring section, and correcting the outline data of the desired pattern using the correction data.

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Notification of Reasons for Rejection issued by the Japanese Patent Office, mailed Jun. 5, 2007, in Japanese Patent Application No. 2005-151063 and English-language translation of Notification.

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