Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2008-09-02
2008-09-02
Chiang, Jack (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000
Reexamination Certificate
active
10986118
ABSTRACT:
A method of reversing the tone of an image to be printed in a layer of radiation sensitive material formed on a substrate includes defining a lithographic problem, designing a patterning device, determining a first illumination arrangement and a radiation sensitive material process capable of printing a positive tone of the lithographic feature; and determining a second illumination arrangement capable of printing a negative tone of the lithographic feature with the radiation sensitive material process.
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Broeke Doug Van Den
Hansen Steven G.
ASML Netherlands B.V.
Memula Suresh
Pillsbury Winthrop Shaw & Pittman LLP
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