Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2006-09-19

2006-09-19

Lee, John R. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C378S034000

Reexamination Certificate

active

07109497

ABSTRACT:
There is provided an illumination system, particularly for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements have negative optical power.

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