Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2005-02-22

2005-02-22

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492100, C378S034000, C359S351000, C359S624000, C359S626000, C359S858000, C355S067000

Reexamination Certificate

active

06858853

ABSTRACT:
There is provided an illumination system for microlithography with wavelengths≦193 nm that includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical element and the second optical element are reflective. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed, at least partially, on a field in the image plane. The first optical component includes a collector unit and a second optical element having a plurality of second raster elements. The illumination system also includes a first optical axis between the collector unit and the first optical element, a second optical axis between the first optical element and the second optical element, and a third optical axis between the second optical element and the second optical component. A directional vector of the first optical axis and a directional vector of the second optical axis define a plane and wherein the first and second optical elements are tilted to cause a crossing of the projection of the third optical axis in to the plane and the first optical axis.

REFERENCES:
patent: 655555 (1900-08-01), Spur
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4651012 (1987-03-01), Clark et al.
patent: 4655555 (1987-04-01), Mächler et al.
patent: 4740276 (1988-04-01), Marmo et al.
patent: 5148442 (1992-09-01), O'Neil et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5353322 (1994-10-01), Bruning et al.
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Furter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5459547 (1995-10-01), Shiozawa
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5647664 (1997-07-01), Hanecka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5846678 (1998-12-01), Nishigori et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5963305 (1999-10-01), Mizouchi
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6081319 (2000-06-01), Ozawa et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6339467 (2002-01-01), Sato
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6594334 (2003-07-01), Ota
patent: 299 02 108 (1999-02-01), None
patent: 19903 807 (1999-11-01), None
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0 939 341 (1999-01-01), None
patent: 0 955 641 (1999-10-01), None
patent: 1 026 547 (2000-09-01), None
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography”, Applied Optics, vol. 32, No. 34, pp. 6920-6929 (Dec. 1, 1993).
“Handbook on Synchrotron Radiation”, Ernst-Echard Koch ed., pp. 140-145, 1098-1111 (1983).

Affiliated with

Also associated with

Rating

Illumination system particularly for microlithography does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Illumination system particularly for microlithography, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Illumination system particularly for microlithography will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3510807