Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2005-09-20

2005-09-20

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C378S034000

Reexamination Certificate

active

06947124

ABSTRACT:
There is provided an illumination system for microlithography with wavelengths ≦193 nm. The illumination system includes a primary light source, a first optical component, a second optical component, an image plane, and an exit pupil. The first optical component transforms the primary light source into a plurality of secondary light sources that are imaged by the second optical component in the exit pupil. The first optical component includes a first optical element having a plurality of first raster elements that are imaged into the image plane, producing a plurality of images being superimposed at least partially on a field in the image plane. The plurality of first raster elements are rectangular. The field is a segment of an annulus, and the second optical component includes a first field mirror with negative optical power for shaping the field to the segment of the annulus and a second field mirror with positive optical power. Each of a plurality of rays intersects the first field mirror with an incidence angle greater than 70° and each of the plurality of rays intersects the second field mirror with an incidence angle of less than 25°.

REFERENCES:
patent: 4195913 (1980-04-01), Dourte et al.
patent: 4294538 (1981-10-01), Ban
patent: 4389115 (1983-06-01), Richter
patent: 4651012 (1987-03-01), Clark et al.
patent: 4688932 (1987-08-01), Suzuki
patent: 4740276 (1988-04-01), Marmo et al.
patent: 4974919 (1990-12-01), Muraki et al.
patent: 5071240 (1991-12-01), Ichihara et al.
patent: 5148442 (1992-09-01), O'Neil et al.
patent: 5222112 (1993-06-01), Terasawa et al.
patent: 5339346 (1994-08-01), White
patent: 5361292 (1994-11-01), Sweatt
patent: 5402267 (1995-03-01), Fürter et al.
patent: 5439781 (1995-08-01), MacDowell et al.
patent: 5440423 (1995-08-01), Ogura
patent: 5459547 (1995-10-01), Shiozawa
patent: 5499282 (1996-03-01), Silfvast
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.
patent: 5644383 (1997-07-01), Mori
patent: 5647664 (1997-07-01), Hane{hacek over (c)}ka
patent: 5669708 (1997-09-01), Mashima et al.
patent: 5677939 (1997-10-01), Oshino
patent: 5715084 (1998-02-01), Takahashi et al.
patent: 5737137 (1998-04-01), Cohen et al.
patent: 5755503 (1998-05-01), Chen et al.
patent: 5796524 (1998-08-01), Oomura
patent: 5805356 (1998-09-01), Chiba
patent: 5846678 (1998-12-01), Nishigori et al.
patent: 5896438 (1999-04-01), Miyake et al.
patent: 5963305 (1999-10-01), Mizouchi
patent: 5993010 (1999-11-01), Ohzawa et al.
patent: 5995582 (1999-11-01), Terashima et al.
patent: 6081319 (2000-06-01), Ozawa et al.
patent: 6198793 (2001-03-01), Schultz et al.
patent: 6208707 (2001-03-01), Oshino
patent: 6229647 (2001-05-01), Takahashi et al.
patent: 6285443 (2001-09-01), Wangler et al.
patent: 6339467 (2002-01-01), Sato
patent: 6400794 (2002-06-01), Schultz et al.
patent: 6438199 (2002-08-01), Schultz et al.
patent: 6507440 (2003-01-01), Schultz
patent: 6570168 (2003-05-01), Schultz et al.
patent: 6583937 (2003-06-01), Wangler et al.
patent: 6594334 (2003-07-01), Ota
patent: RE38438 (2004-02-01), Takahashi
patent: 199 03 807 (1999-11-01), None
patent: 199 23 609 (1999-12-01), None
patent: 0066295 (1982-12-01), None
patent: 0359018 (1990-03-01), None
patent: 0 627 667 (1994-12-01), None
patent: 0 779 558 (1997-06-01), None
patent: 0939341 (1999-09-01), None
patent: 0 955 641 (1999-11-01), None
patent: 1026547 (2000-08-01), None
patent: 1 067 437 (2001-01-01), None
patent: 1 200 878 (2002-05-01), None
Murphy et al., “Synchrotron Radiation Sources and Condensers for Projection X-Ray Lithography”, Applied Optics, vol. 32, No. 34, pp. 6920-6929 (Dec. 1, 1993).
“Handbook on Synchrotron Radiation”, Emst-Echard Koch ed., pp. 140-145, 1098-1111 (1983).
European Search Report dated May 12, 2004. EP Patent Application No. 04 00 3479.

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