Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2008-07-29

2008-07-29

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S071000, C378S034000, C378S035000, C378S145000, C378S154000, C250S492200

Reexamination Certificate

active

07405809

ABSTRACT:
An illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength especially ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

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