Illumination system and polarizer for a microlithographic...

Details Illumination system and polarizer for a microlithographic... Illumination system and polarizer for a microlithographic...

2004-11-19

2008-08-05

Kim, Peter B (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S053000, C355S067000

Reexamination Certificate

active

07408622

ABSTRACT:
An illumination system for a microlithographic projection exposure apparatus includes a light source (1) for generating projection light, a masking arrangement (5) for masking a reticle (R) and a masking objective (6) for imaging the masking arrangement (5) on the reticle (R). A polarizer (10) for generating linearly polarized light is arranged in the masking objective (6). The polarizer (10) may comprise, for example, polarization-selective beam splitting layers (54, 56; 154, 156; 292, 294) arranged at an angle to one another, which are transparent to light in a first polarisation state (68) and reflect light in different second polarisation state (70).

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International Search Report received for International Application No. PCT/EP2004/008892, mailed May 20, 2005.

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