X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1996-07-02
1998-12-08
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 43, G21K 500
Patent
active
058481192
ABSTRACT:
An illumination system includes a spectral optical element for separating radiation light from a radiation source, including at least one of X-rays and vacuum ultraviolet rays. The spectral optical element provides an emission angle to the radiation light which changes with the wavelength thereof. The system also includes an optical arrangement for illuminating an object with radiation light of a particular wavelength from the spectral optical element, and an absorption element for absorbing at least a portion of radiation light of a wavelength longer than the particular wavelength from the spectral optical element.
REFERENCES:
patent: 4028547 (1977-06-01), Eisenberger
Hayashida Masami
Miyake Akira
Canon Kabushiki Kaisha
Church Craig E.
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