Illumination system and exposure apparatus and method

Details Illumination system and exposure apparatus and method Illumination system and exposure apparatus and method

2006-04-04

2006-04-04

Lee, John R. (Department: 2881)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S043000, C355S053000, C355S067000

Reexamination Certificate

active

07023953

ABSTRACT:
An optical apparatus and method guide EUV radiation to a predetermined surface. A radiation source supplies EUV radiation having a certain dispersion angle. An illumination optical system having a reflective integrator forms a secondary radiation source having a predetermined shape based on the EUV radiation supplied from the radiation source. A projection optical system is arranged in an optical path between a reflective mask and the predetermined surface and forms an image of the reflective mask onto the predetermined surface based on the EUV radiation from the reflective mask. The secondary radiation source having the predetermined shape has a shape that is a substantially circular shape, an annular shape, or a multipolar shape.

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