Illumination optics for projection microlithography

Details Illumination optics for projection microlithography Illumination optics for projection microlithography

2007-11-27

2010-12-28

Berman, Jack I (Department: 2881)

Radiant energy

Radiant energy generation and sources

With radiation modifying member

C250S492100, C250S493100, C359S350000, C359S355000, C356S051000

Reexamination Certificate

active

07858957

ABSTRACT:
Illumination optics that can be used, for example, for EUV projection microlithography are disclosed. Also disclosed are illumination systems provided with such illumination optics, projection exposure apparatuses provided with such illumination systems, related methods of manufacturing microstructured elements, and microstructured elements obtained by these methods.

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