Illumination optical system and method of manufacturing semicond

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430396, 359744, 359784, 359791, 355 50, 355 53, 355 67, 355 77, G03F 720, G02B 2709, H01L 21027

Patent

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059552433

ABSTRACT:
An illumination optical system having an afocal optical system includes a first group of lenses having negative refracting power, a second group of lenses having positive refracting power and being positioned further away from a light source than the first group of lenses, and a third group of lenses having positive refracting power and being positioned further away from the light source than the second group of lenses, wherein the afocal optical system expands a parallel beam of light emitted from the light source or converts the parallel beam of light into a parallel beam having equivalent magnification.

REFERENCES:
patent: 5245384 (1993-09-01), Mori
patent: 5724122 (1998-03-01), Oskotsky

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