Illumination optical apparatus and semiconductor device manufact

Details Illumination optical apparatus and semiconductor device manufact Illumination optical apparatus and semiconductor device manufact

1998-10-21

2000-08-22

Sikder, Mohammad Y.

Illumination

Light modifier

Refractor

362327, 355 53, 355 54, 355 67, 355 43, G03B 2742

Patent

active

061061395

ABSTRACT:
An illumination optical apparatus (8) includes a light source (10) and light conducting system (L) that conducts a light beam (14) from the light source to an object (M) such as a mask having a pattern, to be irradiated. A light-attenuating member (18) or other light-intensity controlling member, such as filter, for controlling the intensity of the light beam is arranged in the optical path between the light source and light conducting system. Also disclosed is a method for manufacturing semiconductor devices using the abovementioned illumination optical apparatus. The method includes the steps of determining a photosensitivity of the photosensitive substrate (W), selecting at least one light-attenuating member based on the photosensitivity, inserting the at least one light-attenuating member between the light source and the light conducting system, generating a light beam from the light source and directing the light beam along an axis (A) through the at least one light attenuating member to the light conducting system, illuminating, with the light beam emanating from the light conducting system, a mask having a pattern, and projecting the pattern through a projection optical system (PL) and exposing the photosensitive substrate.

REFERENCES:
patent: 4497015 (1985-01-01), Konno et al.
patent: 4712910 (1987-12-01), Sakato
patent: 4970546 (1990-11-01), Suzuki et al.
patent: 5898477 (1999-04-01), Yoshimura et al.
patent: 5949468 (1999-09-01), Asahina et al.

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