Illuminating apparatus

Details Illuminating apparatus Illuminating apparatus

1995-02-23

1997-10-14

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 359619, H01L 2130

Patent

active

056779399

ABSTRACT:
The present invention relates to an illuminating apparatus for illuminating an illuminated object in an arcuate pattern and, more particularly, to an illuminating apparatus suitably applicable to exposure apparatus suitably used in transferring a circuit pattern on a photomask (mask or reticle) through a reflection type imaging apparatus onto a substrate such as a wafer by the mirror projection method, for example of an X-ray optical system. The illuminating apparatus of the present invention can illuminate the illuminated surface in an arcuate pattern with uniform intensity. Exposure apparatus provided with the illuminating apparatus of the present invention can obtain an image with uniform exposure over the entire arcuate surface as the illuminated surface, so that the pattern on the mask located on the illuminated surface can be accurately transferred with high throughput onto the substrate.

REFERENCES:
patent: 5274435 (1993-12-01), Hettrick
patent: 5512759 (1996-04-01), Sweatt
patent: 5581605 (1996-12-01), Murakami et al.

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