III-V Compound semi-conductor crystal growth from a liquid phase

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156DIG70, 156DIG61, 148172, 118415, 423 87, 423122, B01J 1720, C01B 1900, C01B 2700, C01F 700

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039817644

ABSTRACT:
In an epitaxial growth method in liquid phase for III-V compound semiconductor crystals a solution for crystal growth is at first heated to a temperature which is higher than the temperature of crystal growth, and then cooled to that temperature, whereby a part of the solution crystallizes out as small crystals. This solution is separated by means of a filter means into two parts, one of which contains the small crystals and the other of which does not. A substrate crystal is brought into contact with the latter.

REFERENCES:
patent: 3551219 (1970-12-01), Parrish
patent: 3677228 (1972-06-01), Parrish
patent: 3690965 (1972-09-01), Bergh
patent: 3762367 (1973-10-01), Nishizawa
patent: 3767481 (1973-10-01), Ettenberg
patent: 3792682 (1974-02-01), Phipps
patent: 3896765 (1975-07-01), Ariga
Blum et al., IBM Tech. Disclosure Bulle., vol. 13, No. 11, Apr., 1971, p. 3221.
DeGelormo, IBM Tech. Discl. Bulle., vol. 16, No. 7, Dec., 1973, p. 2158.

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