Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2011-03-29
2011-03-29
Ngo, Ngan (Department: 2893)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S337000, C257S341000, C257S378000, C257SE29066, C257SE29197
Reexamination Certificate
active
07915675
ABSTRACT:
An IGBT includes a first region, a second region located within the first region, a first contact coupled to the first region, a first layer arranged below the first region, a gate overlying at least a portion of the first region between the second region and the first layer and a second layer formed under the first layer. One or more stacked zones are formed within the second layer. Each one or more stacked zones includes a first zone and a second zone that overlies the first zone. Each first zone is inversely doped with respect to the second layer and each second zone is inversely doped with respect to the first zone. The IGBT further includes a third layer formed under the second layer and a second contact coupled to the third layer.
REFERENCES:
patent: 5757081 (1998-05-01), Chang et al.
patent: 6163040 (2000-12-01), Akiyama et al.
patent: 6228719 (2001-05-01), Frisina et al.
patent: 7317225 (2008-01-01), Saito et al.
patent: 7355257 (2008-04-01), Kishimoto et al.
patent: 7462909 (2008-12-01), Saito et al.
patent: 7595536 (2009-09-01), Terashima
Felsl Hans-Peter
Schulze Hans-Joachim
Coats & Bennett P.L.L.C.
Infineon - Technologies AG
Ngo Ngan
LandOfFree
IGBT having one or more stacked zones formed within a second... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with IGBT having one or more stacked zones formed within a second..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and IGBT having one or more stacked zones formed within a second... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2717938