I.sup.2 L Structure and fabrication process compatible with high

Metal working – Method of mechanical manufacture – Assembling or joining

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29576E, 29578, 148175, 148187, 148DIG85, 148DIG87, 148DIG151, 357 44, 357 46, 357 52, 357 92, H01L 2172, H01L 2182

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active

045465398

ABSTRACT:
An integrated circuit wherein the base and surface collector regions of the I.sup.2 L vertical transistor are formed by the same steps used to form the collector and base, respectively, of complementary bipolar transistors. Thus, a high voltage bipolar transistor of the same type as the vertical I.sup.2 L transistor may be formed using separate process steps, thereby optimizing the design of both devices.

REFERENCES:
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Tokumaru et al., "I.sup.2 L with Self-Aligned Double-Diffused Injector" IEEE J. Solid-State Circuits, vol. SC-12, No. 2, (Apr. 1977), pp. 109-114.

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