I-shaped and L-shaped contact structures and their...

Details I-shaped and L-shaped contact structures and their... I-shaped and L-shaped contact structures and their...

2006-11-14

2006-11-14

Le, Thao P. (Department: 2818)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257SE31029, C257S300000, C257S614000

Reexamination Certificate

active

07135727

ABSTRACT:
Contact structures having I shapes and L shapes, and methods of fabricating I-shaped and L-shaped contact structures, are employed in semiconductor devices and, in certain instances, phase-change nonvolatile memory devices. The I-shaped and L-shaped contact structures produced by these methods exhibit relatively small active areas. The methods that determine the contact structure dimensions employ conventional semiconductor deposit and etch processing steps that are capable of creating readily reproducible results.

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