Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2009-03-17
2011-11-08
Lee, Sin J. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S910000, C430S907000, C430S325000, C430S326000, C430S330000, C430S311000, C560S205000, C560S219000, C560S220000, C526S328000, C526S320000
Reexamination Certificate
active
08053165
ABSTRACT:
A hydroxyl-containing monomer of formula (1) is provided wherein R1is H, F, methyl or trifluoromethyl, R2and R3are monovalent C1-C15hydrocarbon groups, or R2and R3may form an aliphatic ring. The monomers are useful for the synthesis of polymers which have high transparency to radiation of up to 500 nm and the effect of controlling acid diffusion so that the polymers may be used as a base resin to formulate radiation-sensitive resist compositions having a high resolution.
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Hasegawa Koji
Kinsho Takeshi
Ohashi Masaki
Watanabe Takeru
Birch & Stewart Kolasch & Birch, LLP
Lee Sin J.
Shin-Etsu Chemical Co. , Ltd.
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