Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2007-05-15
2007-05-15
Gilliam, Barbara L. (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S281100, C430S322000, C430S330000, C525S328800, C525S353000, C525S375000
Reexamination Certificate
active
10863424
ABSTRACT:
The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.
REFERENCES:
patent: 4454274 (1984-06-01), Singer et al.
patent: 4788127 (1988-11-01), Bailey et al.
patent: 5208133 (1993-05-01), Tsumori
patent: 5227276 (1993-07-01), Roeschert et al.
patent: 5230985 (1993-07-01), Lohaus et al.
patent: 5266424 (1993-11-01), Fujino et al.
patent: 5288741 (1994-02-01), Bender et al.
patent: 5292614 (1994-03-01), Ochiai et al.
patent: 5304456 (1994-04-01), Ueda et al.
patent: 5318878 (1994-06-01), Jones et al.
patent: 5340697 (1994-08-01), Yoshimoto et al.
patent: 5376504 (1994-12-01), Graziano et al.
patent: 5445850 (1995-08-01), Das et al.
patent: 5494777 (1996-02-01), Shiraki et al.
patent: 5514755 (1996-05-01), Fenn et al.
patent: 5529885 (1996-06-01), Ochiai et al.
patent: 5536835 (1996-07-01), Randon et al.
patent: 5541263 (1996-07-01), Thackeray et al.
patent: 5585219 (1996-12-01), Kaimoto et al.
patent: 5585220 (1996-12-01), Breyta et al.
patent: 5585222 (1996-12-01), Kaimoto et al.
patent: 5627010 (1997-05-01), Pai et al.
patent: 5738972 (1998-04-01), Padmanaban et al.
patent: 5773190 (1998-06-01), Oie et al.
patent: 5780206 (1998-07-01), Urano et al.
patent: 5789136 (1998-08-01), Sato et al.
patent: 5800964 (1998-09-01), Sato et al.
patent: 5985524 (1999-11-01), Allen et al.
patent: 6054248 (2000-04-01), Foster et al.
patent: 6165697 (2000-12-01), Thackeray et al.
patent: 6316165 (2001-11-01), Pavelchek et al.
patent: 6323287 (2001-11-01), Foster et al.
patent: 6410209 (2002-06-01), Adams et al.
patent: 6602652 (2003-08-01), Adams et al.
patent: 2002/0007018 (2002-01-01), Foster et al.
patent: 2002/0009670 (2002-01-01), Thackeray et al.
patent: 2002/0022196 (2002-02-01), Pavelchek et al.
patent: 2002/0031729 (2002-03-01), Trefonas et al.
patent: 2002/0173594 (2002-11-01), De et al.
patent: 2002/0197556 (2002-12-01), Huang et al.
patent: 0813114 (1997-12-01), None
patent: A-06-118631 (1994-04-01), None
patent: A-07-278234 (1995-10-01), None
patent: A-08-211620 (1996-08-01), None
patent: A-10-142793 (1998-05-01), None
patent: A-10-168132 (1998-06-01), None
patent: A-10-221855 (1998-08-01), None
patent: A-10-319593 (1998-12-01), None
patent: A-11-038622 (1999-02-01), None
patent: A-2002-530696 (2002-09-01), None
patent: WO 97/07145 (1997-02-01), None
patent: WO 98/21038 (1998-05-01), None
patent: WO 98/52225 (1998-11-01), None
patent: WO 99/11457 (1999-03-01), None
patent: WO 99/40624 (1999-08-01), None
patent: WO 00/54105 (2000-09-01), None
European Search Report Jan. 23, 2006.
Silicon in Organic, Organometallic and Polymer Chemistry, Brook, Michael p. 480, 482 (John Wiley and Sons, 2000).
High Resolution 248 nm, Bilayer Resist, Proc., Q. Lin, K. Petrillo & G. Breytaa et al. SPIE, p. 241.
Biafore John Joseph
Blakeney Andrew J.
Foster Patrick
Slater Sydney George
Steinhäusler Thomas
Arch Specialty Chemicals, Inc.
Gilliam Barbara L.
Ohlandt Greeley Ruggiero & Perle LLP
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