Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1998-04-06
1999-12-21
Baxter, Janet
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
4302751, 430313, G03C 1492
Patent
active
060047224
ABSTRACT:
A method for forming an anti-reflective coating (ARC) layer within a fabrication and a fabrication having the anti-reflective coating (ARC) layer formed therein. To practice the method, there is first provided a substrate. There is then formed over the substrate a reflective layer. There is then formed upon the reflective layer an organic polymer anti-reflective coating (ARC) layer, where the organic polymer anti-reflective coating (ARC) layer is formed from an organic polymer anti-reflective coating (ARC) material which is not susceptible to a hydrolysis reaction. There may then be formed upon the organic polymer anti-reflective coating (ARC) layer a photoresist layer which is photoexposed and developed to form a patterned photoresist layer which may be employed as an etch mask for forming a patterned reflective layer from the reflective layer. The patterned reflective layer so formed is formed with uniform and reproducible linewidth dimension.
REFERENCES:
patent: 4617252 (1986-10-01), Cordes, III et al.
patent: 4927736 (1990-05-01), Mueller et al.
patent: 5320935 (1994-06-01), Maeda et al.
patent: 5342739 (1994-08-01), Katou et al.
patent: 5482817 (1996-01-01), Dichiara et al.
patent: 5578676 (1996-11-01), Flaim et al.
Ye Jian-Hui
Zhang Ai-Qiang
Ashton Rosemary
Baxter Janet
Chartered Semiconductor Manufacturing Ltd.
Pike Rosemary L. S.
Saile George O.
LandOfFree
Hydrolytically stable organic polymer material for organic polym does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Hydrolytically stable organic polymer material for organic polym, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrolytically stable organic polymer material for organic polym will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-503378