Hydrogenated carbon composition

Details Hydrogenated carbon composition Hydrogenated carbon composition

1995-05-22

1998-05-12

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427530, 427563, 427527, 427578, 20419216, 20419223, H05H 124, C23C 1406, C23C 1414, C23C 1432

Patent

active

057502102

ABSTRACT:
A composition of matter having an atomic density between that of pure diamond and at least 0.18 g-atoms per cubic centimeter and the formula:
where: 0.ltoreq.z+w.ltoreq.0.15, 0.ltoreq.w.ltoreq.0.05, 0.ltoreq.x.ltoreq.0.10, 0<y<1.5, and, A is boron or oxygen. Variation of the constituents and the parameters of production of the compositions in self-biasing RF cavities, or primary or secondary ion beam methods, allows formation of films of, for example, desired hardness, lubricity, density, electrical conductivity, permeability, adhesion and stress. Variation of the properties allows production of films formed by the composition as a function of depth.

REFERENCES:
patent: 3057808 (1962-10-01), Fierce et al.
patent: 3961103 (1976-06-01), Aisenberg
patent: 4343641 (1982-08-01), Scholes
patent: 4414319 (1983-11-01), Shirai et al.
patent: 4419404 (1983-12-01), Arai et al.
patent: 4429024 (1984-01-01), Ueno et al.
patent: 4461820 (1984-07-01), Shirai et al.
patent: 4464451 (1984-08-01), Shirai et al.
patent: 4471016 (1984-09-01), Scholes
patent: 4477549 (1984-10-01), Fujimaki et al.
patent: 4486521 (1984-12-01), Misumi et al.
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 4490453 (1984-12-01), Shirai et al.
patent: 4540636 (1985-09-01), MacIver et al.
patent: 4594294 (1986-06-01), Eichen et al.
patent: 4620898 (1986-11-01), Banks et al.
patent: 4634648 (1987-01-01), Janson et al.
patent: 4636435 (1987-01-01), Yanagihara et al.
patent: 4647494 (1987-03-01), Meyerson et al.
patent: 4693927 (1987-09-01), Nishikawa et al.
patent: 4735840 (1988-04-01), Hedgcoth
patent: 4737415 (1988-04-01), Ichijo et al.
patent: 4770940 (1988-09-01), Ovshinsky et al.
patent: 4783368 (1988-11-01), Yamamoto et al.
patent: 4833031 (1989-05-01), Kurokawa et al.
patent: 4839244 (1989-06-01), Tsukamoto
patent: 4840844 (1989-06-01), Futamoto et al.
patent: 4880687 (1989-11-01), Yokoyama et al.
patent: 5017403 (1991-05-01), Pang et al.
patent: 5055318 (1991-10-01), Deutchman et al.
patent: 5055421 (1991-10-01), Birkle et al.
patent: 5061322 (1991-10-01), Asano
patent: 5064682 (1991-11-01), Kiyama et al.
patent: 5084319 (1992-01-01), Hibst et al.
patent: 5110679 (1992-05-01), Haller et al.
patent: 5192523 (1993-03-01), Wu et al.
patent: 5266398 (1993-11-01), Hioki et al.
patent: 5275850 (1994-01-01), Kitoh et al.
G. Hawley, ed., The Condensed Chemical Dictionary, 10th Edition Van Nostrand Reinhold Co., 1981 (no month), p. 700.
Oguri et al., "Effect of excess carbon on the hardness of Si-C and Ti-C coatings formed by plasma-assisted chemical vapor deposition", Thin Solid Films, 186 ( May 1990), L29-31.
Arai et al., "Plasma-Assisted Chemical Vapour Deposition of TiN and TiC on Steel: Properties of Coatings" Thin Solid Films, 165 ( Nov. 1988), 139-148.
Bunshah et al., "Deposition Technologies for Films and Coatings," Noyes Publication, 1982, pp. 187-189. no month.
Oguri, "Low Friction Coatings of Diamond-Like Carbon with Silicon Prepared by Plasma-Assisted Chemical Vapor Deposition", J. Mater. Res., vol. 5, No. 11 (Nov. 1990), pp. 2567-2571.
Angus, "Ion Beam Deposition of Amorphous Carbon Films with Diamond Like Properties", Metastable Materials Formation by Ion Implantion, pp. 433-440 (1982). no month.
Forrest et al., "Semiconductor Analysis Using Organic-on-Inorganic Contact Barriers 1. Theory of the Effects of Surface States on Diode Potential and AC Admittance", J. Appl. Physics 59:2 (Jan. 1986) pp. 513-525.
Bubenzer et al., RF-Plasma Deposited Amorphous Hydrogenated Hard Carbon Thin Films: Preparation, Properties, and Applications, J. Appln.Phys. 54(8) (Aug., 1983), pp. 4590-4595.
Jansen, et al., "The Effects of Hydrogenation on the Properties of Ion Beam Sputter Deposited Amorphous Carbon", J. Vac. Sci. Technol. A3(3) (May/Jun. 1985), pp. 605-609.
Nyaiesh, "Chemisorbed Hydrogen On .alpha.-Carbon Films", J. Vac. Sci. Technol. A1(2) (Apr./Jun. 1983), pp. 308-312.
Ojha, "The Growth Kinetics and Properties of Hard and Insulating Carbonaceous Films Grown in an R.F. Discharge", Thin Solid Films, 60 (1979) 213-225. no month.
Venkatesan et al., "Ion Beam Induced Conductivity in Polymer Films," Bell labs Pre-print. no date.
Chemical Abstract 113-182203A, no date, issue 24, 1990, (no month given).
Aiyer et al., "Effect of Mixing Oxygen or Diborane on the Formation of Amorphous Carbon Films From Methane by R.F. Plasma Chemical Vapour Deposition", Thin Solid Films, 163, No. 1, pp. 229-232 (Sep. 1988).
Wyon et al., "Properties of Amorphous Carbon Films Produced by Magnetron Sputtering", Thin Solid Films, 122, No.3 (1984) 203-216. Dec.
Spencer et al., "Ion Beam-Deposited Polycrystalline DiamoneLike Films," Appl. Phys. Let., vol. 29, No. 2, pp. 118-120 (1976). Jul.
Future Tech. Letter, No. 73, Jan. 16, 1989 (Breifing on: Diamondlike Hydrocarbon Film).
Enke, "Some New Results on the Fabrication of and the Mechanical, Electrical and Optical Properties of i-Carbon Layers," Thin solid Films, 80, pp. 227-234 (1981). no month.
Miyazawa et al., "Preparation and Structure of Carbon Film Deposited by a Mass-Separated C+ Ion Beam," J. Appl. Phys., 55(1), pp. 188-193 (Jan. 1984).
Angus, "Categorization of Dense Hydrocarbon Films," Les Editions de Physique, vol. XVII, pp. 179-187 (Jun. 1987).
Chemical Abstract 113:182204B. no date, issue 24, 1990 (no month given).
Angus, "Low-Pressure, Metastable Growth of Diamond and `Diamond-Like` Phases," Science, vol. 241 pp. 913-921 (Aug. 1988).
Angus et al., "Dense `DiamondLike` Hydrocarbons as Random Covalent Networks," J. Vac. Science Technol., vol. 6, No. 3, pp. 1778-1782 (May/Jun. 1988).
Aisenberg et al., "Ion-Beam Deposition of Thin Films of DiamondLike Carbon," J. Applied Physics, vol. 42 No. 7, pp. 2953-2958 (1971).Jun.
Angus, "Empirical Characterization and Naming of `Diamond-Like` Carbon Films," Thin Solid Films, 142, pp. 145-151 (1986). no month.
Torng et al., "Structure and Bonding Studies of the C:N Thin Films Produced by RF Sputtering Method," J. Mater. Res., vol. 5, No. 11, pp. 2490-2496 (Nov. 1990).
Cuomo et al., "Reactive Sputtering of Carbon and Carbide Targets in Nitrogen," J. Vac. Sci. Technol., vol. 16, No. 2, pp. 299-302 (1979). Mar/Apr.
Memming et al., "Properties of Polymeric Layers of Hydrogenated Amorphous Carbon Produced by a Plasma-Activated Chemical Vapour Deposition Process II: Tribological and Mechanical Properties," Thin Solid Films 143, pp. 31-41 (1986). no month.
Beauchamp et al., "Systematic Design Approach Leads to Better Optical Coatings,", Laser Focus/Electro-Optics, pp. 109-118 (May 1988).
Torng et al., "Nitrogen Sputtering Gas Effect on Carbon Thin Films" Journal of the Magnetics Society of Japan; 13:169-174 (1989). no month.
Torng et al., "Enhancement of Diamond SP.sup.3 Bonding in RF Sputtered Carbon Films with Nitrogen Added". no date.
Cuomo et al., "Preparation of Paracyanogen-Like Films," IBM Technical Disclosure Bulletin, 19:2 (1976). Jul.

Affiliated with

Also associated with

Rating

Hydrogenated carbon composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogenated carbon composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogenated carbon composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-977485