Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1986-11-07
1987-11-24
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156646, 156653, 156655, 1566591, 156662, 156667, 156345, 20419232, 204298, 252 791, C23F 102, B44C 122, C03C 1500, C03C 2506
Patent
active
047087668
ABSTRACT:
Disclosed is a method for etching a tin oxide layer (18). The tin oxide layer (18) is masked by selectively forming an etchant-resistant material (20) on it. This material is itself patterned and etched, and then the exposed tin oxide (26) is isotropically etched such that substantially all of the exposed tin oxide (26) is removed. The preferred etchant of the invention comprises a major portion of inert nitrogen gas with a minor portion of hydrogen iodide. A vertical wall reactor (48) is provided for use with the invention in order to achieve a uniform flow and etch rate. In an alternate embodiment, a plasma reactor can be used to perform the etching.
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Heiting Leo N.
Hoel Carlton H.
Powell William A.
Sharp Melvin
Texas Instruments Incorporated
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