Hydrogen gas generators for use in chemical lasers

Details Hydrogen gas generators for use in chemical lasers Hydrogen gas generators for use in chemical lasers

1974-11-08

1976-04-06

Sebastian, Leland A.

Explosive and thermic compositions or charges

Containing free boron or binary compounds of boron or boranes

149 87, 1491092, 423295, 423648, C06B 4300, C06B 2700, C06B 2300, C01B 610

Patent

active

039486990

ABSTRACT:
A storable solid propellant composition based on complex metal boron compds of the general formula M(BH.sub.4).sub.x or M(BD.sub.4).sub.x, (where M equals a metal and x equals the valence of the metal M; M is an alkali metal or an alkali earth metal; H is hydrogen, and D is deuterium) and metal oxides of the general formula Q.sub.2 O.sub.3 (where Q is a trivalent metal selected from iron, aluminum, gallium cobalt, and indium) combined stoichiometrically. The stoichiometric blend is employed in a method for producing high temperature (e.g. 600.degree.C-700.degree.C) hydrogen or deuterium that is acceptable for use in HF/DF and HCl chemical lasers, the gas dynamic laser (GDL), or a source to generate chemically pure and hot hydrogen gas as a reducing fuel.

REFERENCES:
patent: 3108431 (1963-10-01), Armstrong
patent: 3624117 (1971-11-01), Bartoszek
patent: 3666672 (1972-05-01), Hiltz
patent: 3734863 (1973-05-01), Beckert
patent: 3751566 (1973-08-01), Churchill
patent: 3819808 (1974-06-01), Mattson
patent: 3862052 (1975-01-01), Beckert
patent: 3864465 (1975-02-01), Hoffert
patent: 3880987 (1975-04-01), Nahas
patent: 3883644 (1975-05-01), Matzek

Affiliated with

Also associated with

Rating

Hydrogen gas generators for use in chemical lasers does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogen gas generators for use in chemical lasers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen gas generators for use in chemical lasers will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1574658