Hybrid photomask and method of fabricating the same

Details Hybrid photomask and method of fabricating the same Hybrid photomask and method of fabricating the same

2007-08-27

2010-12-07

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07846619

ABSTRACT:
A photomask includes a first region, a second region and a third region. The first and second regions are spaced apart by the third region. A first photomask type is disposed in the first region and a second photomask type, different from the first photomask type, is disposed in the second region. A dummy photomask pattern is disposed in the third region and is structured to form a dummy wafer pattern on a wafer.

REFERENCES:
patent: 5879839 (1999-03-01), Jung et al.
patent: 6749970 (2004-06-01), Lukanc et al.
patent: 2005/0084769 (2005-04-01), Pinkerton et al.
patent: 5-333534 (1993-12-01), None
patent: 7-152144 (1995-06-01), None
patent: 07-152144 (1995-06-01), None
patent: 7-219203 (1995-08-01), None
patent: 96-016315 (1996-12-01), None
patent: 2003-0009328 (2003-01-01), None
patent: 10-2004-0022089 (2004-03-01), None
English language abstract of Korean Publication No. 2003-0009328.
English language abstract of Korean Publication No. 10-2004-0022089.

Affiliated with

Also associated with

Rating

Hybrid photomask and method of fabricating the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hybrid photomask and method of fabricating the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hybrid photomask and method of fabricating the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4222053