Hybrid electronic mask

Details Hybrid electronic mask Hybrid electronic mask

2006-04-04

2006-04-04

Nguyen, Henry Hung (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S067000, C355S053000

Reexamination Certificate

active

07023528

ABSTRACT:
An electronically programmable mask for lithography has an array of individually controllable light sources aligned with an array of individually controllable liquid crystals, so that individual pixels may be turned on or off and phase-shifted to provide a desired light intensity distribution on a wafer. The mask may be used in a contact printing mode or in a reduction projection mode.

REFERENCES:
patent: 5363021 (1994-11-01), MacDonald
patent: 5691541 (1997-11-01), Ceglio et al.
patent: 5998069 (1999-12-01), Cutter et al.
patent: 6020950 (2000-02-01), Shiraishi
patent: 6060224 (2000-05-01), Sweatt et al.
patent: 6084656 (2000-07-01), Choi et al.
patent: 6498685 (2002-12-01), Johnson
patent: 6504644 (2003-01-01), Sandstrom
patent: 6544698 (2003-04-01), Fries
patent: 6798438 (2004-09-01), Beier et al.
patent: 2003/0219572 (2003-11-01), Kruit

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