Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-07-22
1999-12-28
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 427115, 427209, 427471, 427529, 427585, C23C 1434
Patent
active
060076836
ABSTRACT:
The use of vapor deposition techniques enables synthesis of the basic components of a solid oxide fuel cell (SOFC); namely, the electrolyte layer, the two electrodes, and the electrolyte-electrode interfaces. Such vapor deposition techniques provide solutions to each of the three critical steps of material synthesis to produce a thin film solid oxide fuel cell (TFSOFC). The electrolyte is formed by reactive deposition of essentially any ion conducting oxide, such as defect free, yttria stabilized zirconia (YSZ) by planar magnetron sputtering. The electrodes are formed from ceramic powders sputter coated with an appropriate metal and sintered to a porous compact. The electrolyte-electrode interface is formed by chemical vapor deposition of zirconia compounds onto the porous electrodes to provide a dense, smooth surface on which to continue the growth of the defect-free electrolyte, whereby a single fuel cell or multiple cells may be fabricated.
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Jankowski Alan F.
Makowiecki Daniel M.
Rambach Glenn D.
Randich Erik
Carnahan L. E.
Nguyen Nam
The Regents of the University of California
VerSteeg Steven H.
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