Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2005-07-05
2005-07-05
Phung, Anh (Department: 2824)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S315000, C257S317000, C257S309000, C257S213000
Reexamination Certificate
active
06914289
ABSTRACT:
An integrated circuit having a non-volatile HGRAM cell includes a first section having impurity materials implanted into a substrate to form NPN transistor regions and a second section having a gate structure to control the currents conducted in the NPN transistor regions. The gate structure is formed at least above the P-type channel region of the substrate and includes an hourglass shaped material with gates to control the movement of holes through the restricted portion of the hourglass.
REFERENCES:
patent: 5763913 (1998-06-01), Jeong
patent: 6093604 (2000-07-01), Jeong
patent: 6211531 (2001-04-01), Nakazato et al.
patent: 6297989 (2001-10-01), Cloud et al.
patent: 6574143 (2003-06-01), Nakazato
patent: WO 00/70675 (1999-05-01), None
patent: WO 01/06570 (2001-01-01), None
Menz Doug
Parker Lanny L.
Phung Anh
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