Hotplate offset ring

Details Hotplate offset ring Hotplate offset ring

1999-05-27

2000-08-08

Paik, Sang

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

118725, H05B 368, C23C 1600

Patent

active

061005053

ABSTRACT:
There is provided a hotplate offset ring of a unique construction for use in a heat treatment unit of wafer track system so as to achieve a more uniform heat transfer. In a preferred embodiment, this is achieved by a plurality of spacer tabs formed on the offset ring which prevent the possibility of non-uniformities in a gap formed between the wafer and the hotplate by eliminating any raised surfaces.

REFERENCES:
patent: 5434090 (1995-07-01), Chiou et al.
patent: 5474612 (1995-12-01), Sato et al.
patent: 5583736 (1996-12-01), Anderson et al.
patent: 5756964 (1998-05-01), Hsu et al.
patent: 5938850 (1999-08-01), Arami et al.

Affiliated with

Also associated with

Rating

Hotplate offset ring does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hotplate offset ring, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hotplate offset ring will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1152220