Hot plate with in situ surface temperature adjustment

Electric heating – Heating devices – Combined with container – enclosure – or support for material...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

118725, H05B 368, C23C 1600

Patent

active

061005061

ABSTRACT:
An arrangement and method for controlling individual zones of a hot plate which is employed in a post exposure bake step of wafers in the fabrication of semi-conductor devices incorporating photolithographic processes using chemically amplified resist systems. Provided is an in situ temperature-controllable hot plate which includes temperature-controllable surface zones for supporting a standard single wafer, and having loading means which orient the wafer on the hot plate. The hot plate may be segmented into an array of individually controllable heating zones, while mounted above the hot plate is a thermal detection array, such as an infrared(IR) camera or pyroelectric or pyrometric detector which functions to detect and scrutinize the wafer surface temperature with regard to specific locations dispersed across the hot plate surface. This particular data is mapped into the hot plate zones, and the mapped data transmitted into a servo for zonal hot plate adjustment and temperature control.

REFERENCES:
patent: 4918291 (1990-04-01), Higgins et al.
patent: 5099120 (1992-03-01), Turnbull
patent: 5155337 (1992-10-01), Sorrell et al.
patent: 5196353 (1993-03-01), Sandhu et al.
patent: 5280156 (1994-01-01), Niori et al.
patent: 5294778 (1994-03-01), Carman et al.
patent: 5377126 (1994-12-01), Flik et al.
patent: 5396047 (1995-03-01), Schilling et al.
patent: 5702624 (1997-12-01), Liao et al.
patent: 5809211 (1998-09-01), Anderson et al.
patent: 5831249 (1998-11-01), Rohner et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hot plate with in situ surface temperature adjustment does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hot plate with in situ surface temperature adjustment, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hot plate with in situ surface temperature adjustment will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1152241

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.