Hosting structure of nanometric elements and corresponding...

Active solid-state devices (e.g. – transistors – solid-state diode – Mosfet type gate sidewall insulating spacer

Reexamination Certificate

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Details

C257S202000, C257SE39006, C257SE51038, C257SE29170, C977S712000, C977S720000, C977S722000, C977S723000

Reexamination Certificate

active

07456508

ABSTRACT:
A hosting structure of nanometric components is described comprising a substrate, a first multi-spacer level comprising a first plurality of spacers including first conductive spacers parallel to each other, and at least a second multi-spacer level realized above said first multi-spacer level and comprising a second plurality of spacers arranged transversally to said first plurality of spacers and including at least a lower discontinuous insulating layer and an upper layer, including in turn second conductive spacers. In particular, each pair of spacers of the second multi-spacer level defines with a spacer of the first multi-spacer level a plurality of nanometric hosting seats having at least a first and a second conduction terminal realized by portions of the first conductive spacers and of the second conductive spacers faced in the hosting seats. A method for manufacturing such a structure is also described.

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