Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Reexamination Certificate
2007-07-10
2007-07-10
McDonald, Rodney G. (Department: 1753)
Etching a substrate: processes
Gas phase etching of substrate
Application of energy to the gaseous etchant or to the...
C216S059000, C216S060000, C204S192320, C204S192330, C204S298110, C204S298310, C204S298320, C156S345240, C156S345250, C118S715000, C118S7230ER, C118S712000, C118S713000
Reexamination Certificate
active
10811912
ABSTRACT:
An optical window deposition shield including a backing plate having a through hole, and a honeycomb structure having a plurality of adjacent cells configured to allow optical viewing through the honeycomb structure. Each cell of the honeycomb structure has an aspect ratio of length to diameter sufficient to impede a processing plasma from traveling through the full length of the cell. A coupling device configured to couple the honeycomb core structure to the backing plate such that the honeycomb structure is aligned with at least a portion of the through hole in the backing plate. The optical window deposition shield shields the optical viewing window of a plasma processing apparatus from contact with the plasma.
REFERENCES:
patent: 6562186 (2003-05-01), Saito et al.
patent: 6798519 (2004-09-01), Nishimoto et al.
patent: 2000-077395 (2000-03-01), None
The Random House College Dictionary, p. 635, 1982.
Calabrese Paula A.
Fink Steven T.
Mitrovic Andrej S.
McDonald Rodney G.
Tokyo Electron Limited
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