Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
Patent
1990-10-10
1992-04-14
LaRoche, Eugene R.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Plasma generating
31511181, 31511191, 31323131, 250423R, 250425, H01J 4904, H05H 124
Patent
active
051051230
ABSTRACT:
A plasma source incorporates a furnace as a hollow anode, while a coaxial cathode is disposed therewithin. The source is located in a housing provided with an ionizable gas such that a glow discharge is produced between anode and cathode. Radiation or ionic emission from the glow discharge characterizes a sample placed within the furnace and heated to elevated temperatures.
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Battelle (Memorial Institute)
LaRoche Eugene R.
Yoo Do Hyum
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