Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Reexamination Certificate
2002-01-15
2003-11-11
Ver Steeg, Steven H. (Department: 1753)
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
C204S298120, C204S298210
Reexamination Certificate
active
06645358
ABSTRACT:
BACKGROUND OF THE INVENTION
The invention relates to a hollow cylindrical target for a cathode sputtering unit with a hollow cylindrical sputtering material and a target holder, in which the sputtering material has an annular cross section and concentrically surrounds a longitudinal segment of the target holder. The target holder extends out of the sputtering material at least at one end of the target to allow connection to the cathode sputtering unit. The invention also concerns a process for producing this type of target.
EP 0,500,031 B1 discloses various processes for producing a hollow cylindrical sputtering target or a hollow cylindrical target for cathode sputtering. The reference describes targets with a target holder that passes completely through the target, which are suitable especially for sputtering materials that are soft or susceptible to fracture, such as Sn or Si. The sputtering material is applied to the target holder by various processes that cause it to adhere strongly to the target holder, such as plasma spraying, flame spraying, casting in the molten state, electrodeposition, and hot pressing.
EP 0,500,774 B1 describes a sputtering system for coating large areas with a hollow cylindrical target in a vacuum chamber, in which the target is supported in a way which allows it to rotate about its longitudinal axis. Inside the hollow target there is a coolant line and an elongated magnetic structure, which is prevented from turning with the target. The reference describes the production of a hollow cylindrical target without a target holder by casting molten target material and the production of targets with a target holder made, for example, of brass and with the target material formed on the holder by plasma spraying or spraying with molten metal. The hollow cylindrical target is connected to a mounting support by a shaft at each end. The connection of the ends of a hollow cylindrical target by shafts is the method most often employed.
WO 97/15,697 shows this method for connecting a hollow cylindrical target and a mounting support in a cathode sputtering unit in the detail drawing in
FIG. 1
of the reference. The target holder of a target or, in the case of mechanically stable sputtering materials, the hollow cylindrical sputtering material itself is provided at one end with a helical groove, into which a spring is inserted. A shaft, which has a flange at the contact surface with the target holder or the sputtering material and which has a groove with an O-ring in this flange, is mounted flush against the end of the target holder or sputtering material and screwed together with the target holder or sputtering material by a spacing collar. A disadvantage of this is that the machining of the helical groove in the connection region is difficult, especially in the case of long target holders. High equipment expense is required to achieve the dimensional precision in the helical groove that is required for a gastight connection.
Due to the sometimes very expensive sputtering material, cylindrical targets without a target holder are usually recycled after use by melting the remaining material and reusing it. In the case of a hollow cylindrical target with a target holder, the remaining sputtering material is removed from the target holder, e.g., by turning, and the sputtering material in the form of chips is melted and reused. The turned, clean target holder is also reused by recoating it with sputtering material. Due especially to the large target lengths of usually 2.5 to 4 m, this recycling is profitable. With respect to the previously known, single-piece target holders, the connection region of the target holder can be damaged to such an extent during shipment of the used target or by the recycling measures themselves, that reuse or resealing with a shaft, as described above, is not possible. Another disadvantage associated with recycling is that it is usually necessary to separate the sputtering material and the target holder by an expensive machining operation.
SUMMARY OF THE INVENTION
Accordingly, it is an object of the present invention to provide a hollow cylindrical target with a hollow cylindrical sputtering material and a target holder, which overcomes the disadvantages of previously known hollow cylindrical targets. In addition, it is a further object to provide a process for producing a target of this type.
The problem with respect to the development of a hollow cylindrical target is solved in the following way: The at least one part of the target holder that extends from the sputtering material is a single part that can be detached (from the remaining parts of the target) by at least one screw fitting. On the one hand, a screw fitting of this type makes it possible for a damaged connection region of a target holder to be replaced, so that the rest of the target holder can continue to be used. On the other hand, it is then possible to separate the target holder from the hollow cylindrical sputtering material by simply unscrewing it, so that machining operations would be unnecessary.
To achieve a gastight screw fitting between a first space outside the target, namely, the vacuum chamber of the cathode sputtering unit, and a second space inside the target, which is designed to hold coolant lines and magnetic equipment, the screw fitting is preferably made gastight by an O-ring seal, which is situated between the first space outside the target and the second space inside the target.
A suitable O-ring seal for the target in accordance with the invention may be made of a plastic or a soft metal, and the cross section of the O-ring seal may have any desired geometry, although a circular cross section of the O-ring seal is preferred.
Especially when the sputtering material is soft or susceptible to fracture, it has been found to be effective for the target holder to extend from the sputtering material at both ends of the target and for it to consist of a first, a second, and a third individual part, such that the first and the third individual parts extend from the sputtering material at either end of the target. This type of design makes it possible to form the first and the third individual parts with very short lengths. This makes it easier to perform the required machining operations and to achieve a high degree of dimensional precision in the production, for example, of a helical groove for the gastight connection of the first and the third individual parts to the cathode sputtering unit. In this regard, it is advantageous for the first individual part to be screwed together with the second individual part, for the second individual part to be screwed together with the third individual part, and for the second individual part to be undetachably joined along its outside diameter with the inside diameter of the hollow cylindrical sputtering material.
The first, the second, and the third individual parts are preferably screwed together by a fine thread on the outside diameter of the first individual part, on the inside diameter of the second individual part, and on the outside diameter of the third individual part.
An overlapping region of the first and second individual parts and an overlapping region of the second and third individual parts should be at least twice as long as the length of the fine thread for joining these parts. This helps with the centering and guiding of the first and third individual parts in the second individual part, which has a positive effect on the mechanical stability and durability of the screw fittings. However, the choice of the length of the overlapping region and the length of the fine thread is strongly dependent on the given sputtering material and must be redetermined for each material combination and target length.
To make it possible to easily equip the second space inside the target with the magnetic equipment and the coolant line, it has been found to be advantageous for the inside diameters of the first, the second, and the third individual parts to be the same.
Again for sputtering materials that are soft or sus
Heck Ralf
Lupton David
Stenger Bernd
Warkentin Oliver
Ostrolenk Faber Gerb & Soffen, LLP
Ver Steeg Steven H.
W.C. Heraeus GmbH & Co. KG
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