Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-11-21
1990-04-10
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20429816, 20429817, 20429819, 20429823, 20429824, C23C 1434
Patent
active
049158058
ABSTRACT:
A hollow cathode type inverted cylindrical magnetron apparatus construction comprises two separate units each having a rectangular C shape cross section. The two C shaped units are positioned together to form a hollow rectangular parallelpiped like cavity and articles to be sputtered are passed through this cavity.
Bolted construction of simple elements having simple geometry are used to produce a very inexpensive structure which is easily serviceable. This magnetron construction uses permanent magnets all having the same north south pole orientation located behind the target material and surrounded on three sides by magnetic permeable material to confine the magnetic flux path. Hence the lines of force tend to be parallel to the substrate surface of the article very near to that surface and heating of the substrate is minimized. Cooling is provided by coolant carrying tubes interspersed between the magnets and the target material.
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AT&T Bell Laboratories
Steinmetz Alfred G.
Weisstuch Aaron
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