Hollow-cathode magnetron and method of making thin films

Details Hollow-cathode magnetron and method of making thin films Hollow-cathode magnetron and method of making thin films

1991-07-01

1993-07-20

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20429811, 20429814, 20429821, 20429822, 20429823, 20429824, 20429828, C23C 1434

Patent

active

052289630

ABSTRACT:
A hollow-cathode magnetron for the deposition of a film upon a filament like material. A localized plasma is struck within a hollow cylindrical target to sputter material onto said filament. The localized plasma is moved around said target, such that the target is uniformly sputtered and the filament is uniformly coated. The creation and movement of the localized plasma is accomplished utilizing a plurality of bar magnets which rotate around the target, whereby the localized plasma rotates around the sputtering bore of the target. A water jacket surrounds the target and functions to cool the target. Because the plasma is localized, significant portions of the target are advantageously cooled when not being sputtered, such that higher throughput can be obtained. The invention also includes a sputtering shield which functions to inhibit the buildup of a sputtered film upon the electrically active elements, whereby the creation of electrical shorts is prevented.

REFERENCES:
patent: 3884793 (1975-05-01), Penfold et al.
patent: 4322276 (1982-03-01), Meckel et al.
patent: 4407713 (1983-10-01), Zega
patent: 4500408 (1985-02-01), Boys et al.
patent: 4530750 (1985-07-01), Aisenberg et al.
patent: 4622121 (1986-11-01), Wegmann et al.
patent: 4880515 (1989-11-01), Yoshikawa et al.
patent: 4966677 (1990-10-01), Aichert et al.

Affiliated with

Also associated with

Rating

Hollow-cathode magnetron and method of making thin films does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hollow-cathode magnetron and method of making thin films, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hollow-cathode magnetron and method of making thin films will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1758031