Hole forming by cross-shape image exposure

Details Hole forming by cross-shape image exposure Hole forming by cross-shape image exposure

2005-03-01

2005-03-01

Deo, Duy-Vu N. (Department: 1765)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S313000, C430S394000

Reexamination Certificate

active

06861176

ABSTRACT:
A method of forming holes in a layer through a cross-shape image exposure. The method includes removing a section from each corner of the rectangular patterns on a photomask to form cross-shape patterns so that circular or elliptical contact holes are formed on a photoresist layer after photo-exposure and development. Optical image contrast between contacts is increased by the cross-shape patterns on the photomask.

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patent: 6544695 (2003-04-01), Wang et al.
patent: 6573029 (2003-06-01), Takeuchi
patent: 20030104319 (2003-06-01), Lin et al.
patent: S58-78151 (1981-11-01), None
patent: 4-116849 (1992-04-01), None

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