Highly sensitive positive resist mixture

Details Highly sensitive positive resist mixture Highly sensitive positive resist mixture

1987-06-25

1989-04-11

Michl, Paul R.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

5253302, 525366, 525368, 525372, 525370, 525367, 525371, G03C 1495

Patent

active

048206091

ABSTRACT:
A highly sensitive positive resist mixture which comprises a resist having a carboxyl group at the side chain and which is decomposable by high energy rays constituted by a polymer having the formula I ##STR1## where R.sub.1, R.sub.2, . . . R.sub.n represent alkyl groups, halogenated alkyl groups, or aryl groups having five or fewer carbon atoms, or --COORa or --CORb (where Ra and Rb are alkyl groups or halogenated alkyl or aryl groups having five or fewer carbon atoms), and when ##EQU1## m.sub.c /M is in the range of 0.01 to 1.0 and m.sub.1 /M, m.sub.2 /M, . . . m.sub.n /M are respectively in the range of 0.99 to 0, and an additive selected from the group consisting of oxides, halides and organic acid salts of bivalent metals.

REFERENCES:
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patent: 3658534 (1972-04-01), Ishitani et al.
patent: 3740366 (1973-06-01), Sanderson et al.
patent: 3984582 (1976-10-01), Feder et al.
patent: 4024293 (1977-05-01), Hatzakis
patent: 4156745 (1979-05-01), Hatzakis et al.
patent: 4330614 (1982-05-01), Moyer et al.

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