Highly polar cleans for removal of residues from...

Details Highly polar cleans for removal of residues from... Highly polar cleans for removal of residues from...

2006-04-04

2006-04-04

Webb, Gregory (Department: 1751)

Cleaning compositions for solid surfaces, auxiliary compositions

Cleaning compositions or processes of preparing

For cleaning a specific substrate or removing a specific...

C510S407000

Reexamination Certificate

active

07022655

ABSTRACT:
Supercritical carbon dioxide may be utilized to remove resistant residues such as those residues left when etching dielectrics in fluorine-based plasma gases. The supercritical carbon dioxide may include an ionic liquid in one embodiment.

REFERENCES:
patent: 6579343 (2003-06-01), Brennecke et al.
patent: 6624127 (2003-09-01), Brask et al.
patent: 2003/0085156 (2003-05-01), Schoonover
patent: 2004/0097388 (2004-05-01), Brask et al.
patent: 10123467 (2002-11-01), None
“Green Processing Using Ionic Liquids and CO2”, Nature, vol. 399, May 6, 1999, Macmillan Magazine Ltd., pp. 28, 29.

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