Highly durable noncontaminating surround materials for plasma et

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156657, 156345, H01L 21306, B44C 122

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active

053644964

ABSTRACT:
A support and positioning apparatus (10) for supporting and positioning a wafer (12), substrate or the like in a plasma assisted chemical etching process. Surround components (14, 16, 18, 20) positioned around the substrate (12) are comprised of substantially pure magnesium or are aluminum coated with a magnesium fluoride coating such that as a plasma tool associated with the plasma etching process traverses the edge of the substrate (12), the plasma etching environment generated from a fluorine containing feed gas emitted from the plasma tool does not significantly erode the surround components (14, 16, 18, 20) or cause contamination of the substrate (12).

REFERENCES:
patent: 4400235 (1983-08-01), Coquin et al.
patent: 4419201 (1983-12-01), Levinstein et al.
patent: 4473455 (1984-09-01), Dean et al.
patent: 4668366 (1987-05-01), Zarowin
patent: 5268200 (1993-12-01), Steger

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