High withstand voltage semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – In integrated circuit

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Details

257493, 257495, 257170, 257173, H01L 2358

Patent

active

059694009

ABSTRACT:
A semiconductor device includes a first semiconductor layer of a first conductivity type having first and second main surfaces, a second semiconductor layer of a second conductivity type selectively formed on the first main surface of the first semiconductor layer, the second semiconductor layer including a first region having a relatively high injection efficiency and a second region having a relatively low injection efficiency and the first region being surrounded by the second region, a third semiconductor layer of the first conductivity type formed on the second main surface of the first semiconductor layer, a first electrode selectively formed on the second semiconductor layer of the second conductivity type and connected to at least the first region, and a second electrode formed on the third semiconductor layer of the first conductivity type.

REFERENCES:
patent: 4377816 (1983-03-01), Sittig
patent: 5101244 (1992-03-01), Mori et al.
patent: 5162876 (1992-11-01), Kitagawa et al.

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