Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – In integrated circuit
Patent
1996-03-12
1999-10-19
Chaudhuri, Olik
Active solid-state devices (e.g., transistors, solid-state diode
With means to increase breakdown voltage threshold
In integrated circuit
257493, 257495, 257170, 257173, H01L 2358
Patent
active
059694009
ABSTRACT:
A semiconductor device includes a first semiconductor layer of a first conductivity type having first and second main surfaces, a second semiconductor layer of a second conductivity type selectively formed on the first main surface of the first semiconductor layer, the second semiconductor layer including a first region having a relatively high injection efficiency and a second region having a relatively low injection efficiency and the first region being surrounded by the second region, a third semiconductor layer of the first conductivity type formed on the second main surface of the first semiconductor layer, a first electrode selectively formed on the second semiconductor layer of the second conductivity type and connected to at least the first region, and a second electrode formed on the third semiconductor layer of the first conductivity type.
REFERENCES:
patent: 4377816 (1983-03-01), Sittig
patent: 5101244 (1992-03-01), Mori et al.
patent: 5162876 (1992-11-01), Kitagawa et al.
Minami Yoshihiro
Omura Ichiro
Shinohe Takashi
Chaudhuri Olik
Kabushiki Kaisha Toshiba
Wille Douglas A.
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