Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent
1993-02-01
1993-12-28
Prenty, Mark V.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
257344, 257367, 257401, 257409, H01L 2968, H01L 2910, H01L 2701, H01L 2940
Patent
active
052742598
ABSTRACT:
In a method for constructing a semiconducting device, within a substrate of a first conductivity type there is formed a well of second conductivity type. Within the well, an extended drain region of a first conductivity type is formed. An insulating region over the extended drain region is formed. A gate region is formed on a surface of the substrate. A first side of the gate region is adjacent to a first end of the extended drain region. A drain region of the first conductivity type is formed. The drain region is in contact with a second end of the extended drain region. A source region is formed on a second side of the gate region.
REFERENCES:
Vladimir Rumennik, David L. Heald, Integrated High and Low Voltage CMOS Technology, IEEE 28th Int. Electron Devices Meeting, pp. 77-80, 1982.
Grabowski Wayne B.
Rumennik Vladimir
Power Integrations, Inc.
Prenty Mark V.
Weller Douglas L.
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