Active solid-state devices (e.g. – transistors – solid-state diode – With means to increase breakdown voltage threshold – With physical configuration of semiconductor surface to...
Patent
1998-03-13
2000-04-25
Guay, John
Active solid-state devices (e.g., transistors, solid-state diode
With means to increase breakdown voltage threshold
With physical configuration of semiconductor surface to...
257618, 257619, 257487, H01L 2358, H01L 2906
Patent
active
060547480
ABSTRACT:
A semiconductor power device includes a high-resistance semiconductor substrate of the first conductivity type having first and second major surfaces and a recess in either one of the first and second major surfaces, and a semiconductor power element with a field relaxation structure, at least part of which is formed in a region of the semiconductor substrate where the recess is formed.
REFERENCES:
patent: 3370209 (1968-02-01), Davis et al.
patent: 4374389 (1983-02-01), Temple
patent: 4927772 (1990-05-01), Arthur et al.
M. Kitagawa, et al., "High Voltage (4KV) Emitter Short Type Diode (ESD)", Proc. ISPSD 1992, pp. 60-65.
T. Matsushita, et al., "Highly Reliable High-Voltage Transistors by Use of the SIPOS Process", IEEE Transactions on Electron Devices, vol. ED-23, No. 8, Aug. 1976.
Shinohe Takashi
Tsukuda Masanori
Yamaguchi Masakazu
Guay John
Kabushiki Kaisha Toshiba
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