Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-03-28
2006-03-28
Schillinger, Laura M. (Department: 2813)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S330000, C257S332000, C257S502000
Reexamination Certificate
active
07019358
ABSTRACT:
A semiconductor device includes a substrate layer having a first dopant density, an epitaxial layer comprising a second dopant density formed on the substrate layer and a semiconductor switch formed on the epitaxial layer, wherein the semiconductor switch comprises an active region of the semiconductor device. A first thickness of the epitaxial layer in the active region is less than a second thickness of the epitaxial layer in a termination region formed peripherally to the active region. The increased thickness of the epitaxial layer in the termination region enables the semiconductor device to have a relatively higher breakdown voltage without increasing the on-resistance of the semiconductor switch.
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Clare, Inc.
McDermott Will & Emery LLP
Schillinger Laura M.
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