High-voltage lateral transistor with a multi-layered...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S367000, C257S488000, C438S268000

Reexamination Certificate

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06987299

ABSTRACT:
A high-voltage transistor with a low specific on-state resistance and that supports high voltage in the off-state includes one or more source regions disposed adjacent to a multi-layered extended drain structure which comprises extended drift regions separated from field plate members by one or more dielectric layers. The layered structure may be fabricated in a variety of orientations. A MOSFET structure may be incorporated into the device adjacent to the source region, or, alternatively, the MOSFET structure may be omitted to produce a high-voltage transistor structure having a stand-alone drift region. It is emphaized that this abstract is provided to comply with the rules requiring an abstract that will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims 37 CFR 1.72(b).

REFERENCES:
patent: 4343015 (1982-08-01), Baliga et al.
patent: 4531173 (1985-07-01), Yamada
patent: 4618541 (1986-10-01), Forouhi et al.
patent: 4626789 (1986-12-01), Nakata et al.
patent: 4626879 (1986-12-01), Colak
patent: 4665426 (1987-05-01), Allen et al.
patent: 4738936 (1988-04-01), Rice
patent: 4754310 (1988-06-01), Coe
patent: 4764800 (1988-08-01), Sander
patent: 4796070 (1989-01-01), Black
patent: 4811075 (1989-03-01), Eklund
patent: 4890144 (1989-12-01), Teng et al.
patent: 4890146 (1989-12-01), Williams et al.
patent: 4922327 (1990-05-01), Mena et al.
patent: 4926074 (1990-05-01), Singer et al.
patent: 4929987 (1990-05-01), Einthoven
patent: 4939566 (1990-07-01), Singer et al.
patent: 4963951 (1990-10-01), Adler et al.
patent: 4967246 (1990-10-01), Tanaka
patent: 5010024 (1991-04-01), Allen et al.
patent: 5025296 (1991-06-01), Fullerton et al.
patent: 5040045 (1991-08-01), McArthur et al.
patent: 5068700 (1991-11-01), Yamaguchi et al.
patent: 5146298 (1992-09-01), Eklund
patent: 5155574 (1992-10-01), Yamaguchi
patent: 5237193 (1993-08-01), Williams et al.
patent: 5258636 (1993-11-01), Rumennik et al.
patent: 5270264 (1993-12-01), Andideh et al.
patent: 5294824 (1994-03-01), Okada
patent: 5306656 (1994-04-01), Williams et al.
patent: 5313082 (1994-05-01), Eklund
patent: 5324683 (1994-06-01), Fitch et al.
patent: 5349225 (1994-09-01), Redwine et al.
patent: 5359221 (1994-10-01), Miyamoto et al.
patent: 5386136 (1995-01-01), Williams et al.
patent: 5438215 (1995-08-01), Tihanyi
patent: 5473180 (1995-12-01), Ludikhuize
patent: 5514608 (1996-05-01), Williams et al.
patent: 5521105 (1996-05-01), Hsu et al.
patent: 5550405 (1996-08-01), Cheung et al.
patent: 5637898 (1997-06-01), Baliga
patent: 5648283 (1997-07-01), Tsang et al.
patent: 5654206 (1997-08-01), Merrill
patent: 5656543 (1997-08-01), Chung
patent: 5659201 (1997-08-01), Wollensen
patent: 5663599 (1997-09-01), Lur
patent: 5665994 (1997-09-01), Palara
patent: 5670828 (1997-09-01), Cheung et al.
patent: 5679608 (1997-10-01), Cheung et al.
patent: 5716887 (1998-02-01), Kim
patent: 5760440 (1998-06-01), Kitamura et al.
patent: 5821144 (1998-10-01), D'Anna et al.
patent: 5869875 (1999-02-01), Herbert
patent: 5917216 (1999-06-01), Floyd et al.
patent: 5929481 (1999-07-01), Hshieh et al.
patent: 5943595 (1999-08-01), Akiyama et al.
patent: 5973360 (1999-10-01), Tihanyi
patent: 5998833 (1999-12-01), Baliga
patent: 6010926 (2000-01-01), Rho et al.
patent: 6049108 (2000-04-01), Williams et al.
patent: 6077748 (2000-06-01), Gardner et al.
patent: 6111289 (2000-08-01), Udrea
patent: 6127703 (2000-10-01), Letavic et al.
patent: 6133607 (2000-10-01), Funaki et al.
patent: 6184555 (2001-02-01), Tihanyi et al.
patent: 6191447 (2001-02-01), Baliga
patent: 6194283 (2001-02-01), Gardner et al.
patent: 6207994 (2001-03-01), Rumennik et al.
patent: 6284605 (2001-09-01), Kim et al.
patent: 6294818 (2001-09-01), Fujihira
patent: 6353252 (2002-03-01), Yasuhara et al.
patent: 6365932 (2002-04-01), Kouno et al.
patent: 6376878 (2002-04-01), Kocon
patent: 6388286 (2002-05-01), Baliga
patent: 6462377 (2002-10-01), Hurky et al.
patent: 6468847 (2002-10-01), Disney
patent: 6509220 (2003-01-01), Disney
patent: 6518144 (2003-02-01), Nitta et al.
patent: 6525372 (2003-02-01), Baliga
patent: 6534823 (2003-03-01), Hueting et al.
patent: 6555873 (2003-04-01), Disney et al.
patent: 6573558 (2003-06-01), Disney
patent: 6635544 (2003-10-01), Disney
patent: 6667213 (2003-12-01), Disney
patent: 2001/0015459 (2001-08-01), Watanabe et al.
patent: 2002/0056884 (2002-05-01), Baliga
patent: 2002/0175351 (2002-11-01), Baliga
patent: 43 09 764 (1994-09-01), None
patent: 1073 123 (2000-07-01), None
patent: 2 309 336 (1997-01-01), None
patent: 56-38867 (1981-04-01), None
patent: 57-10975 (1982-01-01), None
patent: 57-12557 (1982-01-01), None
patent: 57-12558 (1982-01-01), None
patent: 60-64471 (1985-04-01), None
patent: 3-211771 (1991-09-01), None
patent: 4107877 (1992-04-01), None
patent: 6-224426 (1994-08-01), None
patent: WO 97/35346 (1997-09-01), None
patent: WO 99/34449 (1999-07-01), None
patent: WO 00/33385 (2000-06-01), None
patent: WO 02/41402 (2002-05-01), None
patent: WO 02/099909 (2002-12-01), None
“High Voltage Thin Layer Devices (RESURF Devices),” Apples and Vaes, IEDM Tech Digest, Dec. 3-4-5, 1979, pp 238-241.
“Realization of High Breakdown Voltage (>700V) in Thin SOI Devices,” S. Merchan, et al., Phillips Laboratories North America, 1991 IEEE, pp 31-35.
Patent Abstract of Japan, Kawasaki, et al., vol. 16, No. 347(E-1240), JP04-107867, Jul. 27, 1992.
“Theory of Semiconductor Superjunction Devices,” Fujihira, Japan Journal of Applied Physics vol. 36, Oct. 1997, pp 6254-6262.
“Air-Gap Formation During IMD Deposition to Lower Interconnect Capacitance,” Shieh, et al., IEEE Electron Device Letters vol. 17 No. 1, Jan. 1998.
Oxide-Bypassed VDMOS (OBVDMOS): An Alternative to Superjunction High-Voltage MOS Power Devices, Liang, et al., IEEE Electron Devices Letters, vol. 22, No. 8, Aug. 8, 2001, pp 407-409.
“Comparison of High-Voltage Devices for Power Integrated Circuits,” Anaman, et al., IEDM 84, pp 258-261.
“A New Generation of High-Voltage MOSFETs Breaks the Limit Line of Silicon,” Debby, et al. Siemens AG, Munchen, Germany, IEDM 98-683—IEDM 98-685.
“High Performance 600V Smart Power Technology Based on Thin Layer Silicon-on-Insulators,” Letavic, et al, Phillips Research, 4 pages.
“Modern Semiconductor Device Physics,” Sze, et al., John Wiley & Sons, Chapter 4 (“Power Devices”), 1998, pp 203-206.
“Modeling and Optimisation of Lateral High Voltage IC Devices to Minimize 3-D Effects,” Hamza Yilmaz, R&D Engineering, General Electric Co., NC, pp 290-294.
“Optimization of the Specific On-Resistance of the COOLMOS™, ” Chen, et al., IEEE Transactions on Electron Devices, vol. 48, No. 2, Feb. 1, pp 344-348.
“Lateral Unbalanced Super Junction (USJ) / 3D-RESURF for High Breakdown Voltage on SOI,” Ng, et al., Apr. 6, 2001, pp 395-398.
“Static and Dynamic Electricity,” William R. Smythe, McGraw hill Book Company, Inc., New York, 1950.

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