High tilt implant angle performance using in-axis tilt

Details High tilt implant angle performance using in-axis tilt High tilt implant angle performance using in-axis tilt

2007-12-28

2010-10-26

Berman, Jack I (Department: 2881)

Radiant energy

Means to align or position an object relative to a source or...

C250S492100, C250S492200, C250S492210, C250S492300

Reexamination Certificate

active

07820985

ABSTRACT:
The present invention comprises a method for high tilt angle implantation, with angular precision not previously achievable. An ion beam, having a width and height dimension, is made up of a number of individual beamlets. These beamlets typically display a higher degree of parallelism in one of these two dimensions. Thus, to minimize angular error, the workpiece is tilted about an axis substantially perpendicular to the dimension having the higher degree of parallelism. The workpiece is then implanted at a high tilt angle and rotated about a line orthogonal to the surface of the workpiece. This process can be repeated until the high tilt implantation has been performed in all required regions.

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