High throughput high-yield vacuum deposition system

Details High throughput high-yield vacuum deposition system High throughput high-yield vacuum deposition system

2007-03-27

2007-03-27

Bashore, Alain L. (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

C427S250000, C427S523000, C427S566000, C427S581000, C427S585000

Reexamination Certificate

active

09902250

ABSTRACT:
A vacuum deposition system has been designed to produce thin film based demultiplexers with high throughput and production yields of greater than 25% for use in Dense Wavelength Division Multiplexer (DWDM) systems. The system employs a dense array of high yield fixtures and an ion assisted movable dual electron beam evaporation system. The fixture array increases acceptable yields of narrow band pass filters to 25–75% compared to less than 5% in conventional coating systems used for DWDM. The movable e-beam system allows critical symmetry to be maintained while eliminating significant delays resulting from deposition of two materials from a single electron gun. The vacuum deposition system will enable production of more than 15,000 50–200 GHZ filters which meet specifications for DWDM demultiplexers every 48 hours.

REFERENCES:
patent: 4101925 (1978-07-01), Kelley et al.
patent: 4747922 (1988-05-01), Sharp
patent: 4842893 (1989-06-01), Yializis et al.
patent: 5529671 (1996-06-01), Debley et al.
patent: 5725413 (1998-03-01), Malshe et al.
patent: 5748350 (1998-05-01), Pan et al.
patent: 6205270 (2001-03-01), Cao
patent: 6233261 (2001-05-01), Mesh et al.
Kumar, et al.;Near-Infrared Bandpass Filter from Si/SiO2; Multilayer Coatings; Feb 1999.
Suntola, T.;Cost-Effective Processing by Atomic Layer Epitaxy;.1993.
Bachman, et al.;Molecular Layer Expitaxy by Real-Time Optical Process Monitoring; Department of Materials Science and Engineering, North Carolina State University, 1997.
H., Kawai, T. Tabata;Atomic Layer Control of the Growth of Oxide Superconductors Using Laser Molecular Beam Epitaxy; 1997.
Spiller, E;Smoothing of Multilayer X-Ray Mirrors by Ion Polishing; IBM Research Division, Thomas J. Watson; 1993.
Puik, E.J, van der Wiel and Zeijlemaker, H, and Verhoeven, J.;Ion Etching of Thin W Layers: Enhancing Reflectivity of W-C Multilayer Coatings; Mar. 30, 1989.
Nishizawa, J., Abe, H., and Kurabayshi, T.J. 132 (5) (1985).
Puik, E.J., et al.;Appln. Surf. Sci. 47 (1991) 251.
Kloidt, A, et al.;Thin Sol Films, 228 (1993) 154.
Imai, F., Kunimori, K., and Nozoye, H;Novel Epitaxial Growth Mechanism of Magesium Oxide/Titanium Oxide Ceramics Superlattice Thin Films Observed by Reflection High-Energy Electron Diffraction; Nov. 8, 1993.
Kildemo, et al.;Real Time Control of the Growth of Silicon Alloy Multiwavelength Ellipsometry; 1996.

Affiliated with

Also associated with

Rating

High throughput high-yield vacuum deposition system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High throughput high-yield vacuum deposition system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High throughput high-yield vacuum deposition system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3796916