High threshold metal oxide silicon read-only-memory transistors

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257391, 257408, 257344, 257900, H01L 2976

Patent

active

054988969

ABSTRACT:
A method of forming ROM transistor memory cell including not forming lightly doped regions in the semiconductor substrate for some of the memory cells so as to form one type of memory cell and forming the lightly doped regions in another type of memory cell.

REFERENCES:
patent: 4406049 (1983-09-01), Tam et al.
patent: 4536944 (1985-08-01), Bracco et al.
patent: 4599118 (1986-07-01), Han et al.
patent: 4649629 (1987-03-01), Miller et al.
patent: 5081052 (1992-01-01), Kobayashi et al.
patent: 5200802 (1993-04-01), Miller

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

High threshold metal oxide silicon read-only-memory transistors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High threshold metal oxide silicon read-only-memory transistors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High threshold metal oxide silicon read-only-memory transistors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2102571

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.