Coating apparatus – Gas or vapor deposition
Reexamination Certificate
2011-04-05
2011-04-05
Lund, Jeffrie R (Department: 1716)
Coating apparatus
Gas or vapor deposition
C156S345290, C156S345330, C156S345340
Reexamination Certificate
active
07918938
ABSTRACT:
A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths. The manifold includes an internal inert gas channel for purging reactant lines within the block inlet manifold
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Hickson Craig B.
Provencher Timothy J.
ASM America Inc.
Knobbe Martens Olson & Bear LLP
Lund Jeffrie R
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