Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2003-06-18
2010-02-16
Meeks, Timothy (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S906000, C427S573000, C427S577000
Reexamination Certificate
active
07662441
ABSTRACT:
Disclosed is a method for manufacturing a diamond film of electronic quality at a high rate using a pulsed microwave plasma. The plasma that has a finite volume is formed near a substrate (in a vacuum chamber) by subjecting a gas containing at least hydrogen and carbon to a pulsed discharge. The pulsed discharge has a succession of low-power states and of high-power states and a peak absorbed power PC, in order to obtain carbon-containing radicals in the plasma. These carbon-containing radicals are deposited on the substrate in order to form a diamond film. Power is injected into the volume of the plasma with a peak power density of at least 100 W/cm3, while maintaining the substrate to a substrate temperature of between 700° C. and 1000 ° C.
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Duten Xavier
Gicquel Alix Hélène
Hassouni Khaled
Lombardi Guillaume Vincent
Rousseau Antoine
Centre National de la Recherche Scientifique "CNRS"
Gambetta Kelly M
McDonnell Boehnen & Hulbert & Berghoff LLP
Meeks Timothy
Universite Paris Nord (Paris XII) Institut Galilee
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