Mineral oils: processes and products – Chemical conversion of hydrocarbons – Reforming
Patent
1987-04-06
1988-03-22
Sneed, Helen M. S.
Mineral oils: processes and products
Chemical conversion of hydrocarbons
Reforming
208135, 208 48R, 208310R, C10G 3504
Patent
active
047326654
ABSTRACT:
An improved catalytic reforming process. The process is operated at high severity in order to obtain a reformate product having an enhanced octane rating. Higher octane reformate is required to compensate for the reduction or total elimination of lead-based additives used in motor gasoline for increasing octane rating, since reformate is a primary component of motor gasoline. High severity operation results in the formation of quantities of polycyclic aromatic compounds whose presence is highly undesirable. These compounds are removed from the vaporous products of the catalytic reforming process by adsorption on an appropriate material. It was totally unexpected to find that these very high molecular weight compounds are present in vapor streams comprised of hydrogen and light normally-gaseous hydrocarbons such as methane, ethane, and propane.
REFERENCES:
patent: 2958644 (1960-11-01), Kimberlin, Jr. et al.
patent: 3619407 (1971-11-01), Hendricks et al.
patent: 3647680 (1972-03-01), Greenwood et al.
patent: 3793182 (1974-02-01), Ward
patent: 4129496 (1978-12-01), Loboda
patent: 4203825 (1980-05-01), Kmak et al.
patent: 4447315 (1984-05-01), Lamb et al.
patent: 4483766 (1984-11-01), James, Jr.
Bennett Richard W.
Cottrell Paul R.
Gilsdorf Norman L.
Winfield Michael D.
Caldarola Glenn
Cordovano Richard J.
McBride Thomas K.
Sneed Helen M. S.
Spears Jr. John F.
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